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Increasing Product Quality by Particle Deposition Control

 

Brookhuis ADI-Cleanroom provides monitoring solutions for cleanrooms in operation.

The risk of product contamination is proportional to the deposition rate of particles.

A cleanroom or controlled clean environment is used to keep a vulnerable surface clean.

The critical surface can be a product or part surface or a patient wound or vulnerable area.

Deposition of particles of microbe carrying particle can cause unwanted contamination direct or indirect through contaminate contact surface.

By setting particle deposition rate limits and real-time monitoring the particle deposition rate the contamination control be made effective.

Real-time particle deposition monitoring provides data that can be used to improve the contamination control solution when required.

 

www.brookhuis.com

agricola@brookhuis.com

gerbrands@brookhuis.com

 

GRATIS Lid WORDEN

Over BCW

 

BCW is een onafhankelijke cleanroom vereniging met als doel, informatie  verstrekken rond het bouwen en uitbaten van cleanrooms volgens nationale en internationale normen, standaarden en goede praktijken.

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